LOW-TEMPERATURE DEPOSITION OF ULTRAFINE RUTILE TIO2 THIN-FILMS BY THEHYDROTHERMAL METHOD

Ultrafine (50 x 20 nm(2)) rutile TiO2 thin films (0.18 mu m) on alpha- Al2O3 substrates have,een prepared by hydrothermal treatment of a solu tion of a mixture of TiO42- (0.5 M) and HNO3(2.0 M) at low temperature s. Films prepared in the temperature range of 100 to 200 degrees C con tain only the rutile phase and adhere well to the substrates. The acid ity of the solution and the hydrothermal treatment time are the critic al parameters determining the formation of pure rutile phase.