S. Rajesh et al., OPTIMIZATION OF SI MESFET MODEL WITH PEARSON DISTRIBUTION (FMA) - A NOVEL-APPROACH, International journal of electronics, 81(3), 1996, pp. 275-283
A new optimal predictive model of ion-implanted Si d-MESFETs with impr
oved performance is proposed. We demonstrate quantitatively that Pears
on's higher moments have a major influence on the device performance.
An enhancement in the drain-source current is reported. Reduction of t
he threshold voltage is also established when compared with the gaussi
an approach. The closer agreement with the experimental data confirms
the validity of this model.