PHOTOLUMINESCENCE STUDY OF INASSB INASSBP HETEROSTRUCTURES GROWN BY LOW-PRESSURE METALORGANIC CHEMICAL-VAPOR-DEPOSITION/

Citation
S. Kim et al., PHOTOLUMINESCENCE STUDY OF INASSB INASSBP HETEROSTRUCTURES GROWN BY LOW-PRESSURE METALORGANIC CHEMICAL-VAPOR-DEPOSITION/, Applied physics letters, 69(11), 1996, pp. 1614-1616
Citations number
12
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
69
Issue
11
Year of publication
1996
Pages
1614 - 1616
Database
ISI
SICI code
0003-6951(1996)69:11<1614:PSOIIH>2.0.ZU;2-N
Abstract
Photoluminescence has been measured for double- and separate-confineme nt InAsSb/InAsSbP heterostructures grown by low-pressure metalorganic vapor deposition. A measurement of the integrated luminescence intensi ty at the temperature range of 77-300 K shows that over a wide range o f excitation level (1-5 x 10(2) W/cm(2)) the radiative transitions are the dominant mechanism below T similar to 170 K. Auger recombination coefficient C = C-0 exp(-E(a)/kT) with C-0 approximate to 5 x 10(-27) Cm-6/s and E(a) approximate to 40 meV has been estimated. (C) 1996 Ame rican Institute of Physics.