INTEREST OF PULSED AND MODULATED DC DISCHARGES FOR DEPOSITING INSULATING COMPOUNDS BY REACTIVE MAGNETRON SPUTTERING

Reactive magnetron sputtering using de discharges simultaneously pulse d at medium-frequency (a few tenths of kHz) and modulated at low-frequ ency (a few Hz) enables the deposition of insulating ceramic films wit h a high growth rate and an excellent physical quality. The medium-fre quency pulses and the low-frequency modulation respectively favour the long time stability of the electric conditions (suppression of arcing ) and of the sputtering process itself (dynamic control of the target poisoning by the reactive gas).