T. Czerwiec et al., DETERMINATION OF N AND O ATOM DENSITY IN AR-N-2-H-2 AND AR-O-2-H-2 FLOWING MICROWAVE POST DISCHARGES, Journal de physique. III, 6(9), 1996, pp. 1205-1212
Citations number
28
Categorie Soggetti
Material Science","Phsycs, Fluid & Plasmas","Physics, Applied
Number densities of N and O atoms have been determined using NO titrat
ion in Ar-N-2, Ar-N-2-H-2, Ar-O-2 and Ar-O-2-H-2 flowing microwave (2
450 MHz) post-discharges at 300 and 1500 Pa. The NO titration scheme i
s discussed from a kinetics point of view and applied to the high dilu
tion of molecular gases in argon. The N/N-2 density ratio is enhanced
by a factor 3 when small quantities of H-2 are introduced in Ar-N-2 di
scharges. The high O/O-2 density ratio obtained in Ar-O-2 post-dischar
ges (0.5 to 0.6) are probably due to adsorbed H2O that inhibits surfac
e recombination of O-atom. The effect of H-2 addition in Ar-O-2 microw
ave discharge at 1500 Pa is to decrease the O atom density by homogene
ous reaction involving H atoms and OH radicals.