QUANTITATIVE SURFACE STRESS MEASUREMENTS ON AU(111) ELECTRODES BY SCANNING-TUNNELING-MICROSCOPY

Authors
Citation
W. Haiss et Jk. Sass, QUANTITATIVE SURFACE STRESS MEASUREMENTS ON AU(111) ELECTRODES BY SCANNING-TUNNELING-MICROSCOPY, Langmuir, 12(18), 1996, pp. 4311-4313
Citations number
19
Categorie Soggetti
Chemistry Physical
Journal title
ISSN journal
07437463
Volume
12
Issue
18
Year of publication
1996
Pages
4311 - 4313
Database
ISI
SICI code
0743-7463(1996)12:18<4311:QSSMOA>2.0.ZU;2-S
Abstract
Using macroscopic cantilevers of evaporated Au(111) films on glass sub strates in conjunction with scanning tunneling microscopy, we performe d quantitative surface stress measurements of copper underpotential de position in bromide and chloride acid solutions. Upon differentiation of the stress data with respect to potential, definite signatures of t he corresponding voltammograms were obtained, in contrast to previous contentions of the applicability of the Lippmann equation to solid ele ctrodes which predicts such signatures only for the second derivative of the stress.