MORPHOLOGY CONTROL OF FILMS FORMED BY ATMOSPHERIC-PRESSURE CHEMICAL-VAPOR-DEPOSITION USING TETRAETHYLORTHOSILICATE OZONE SYSTEM/

The effects of the reaction time of gas-phase intermediates, t(r), ini tial concentrations of TEOS (C-TEOSin) and O-3 (C-O3in), and O-3 conce ntration on a substrate C-O3s, on film formation by atmospheric-pressu re chemical vapor deposition using tetraethylorthosilicate (TEOS) and ozone (O-3) were experimentally investigated. These four deposition pa rameters were altered by varying the merge position of TEOS/He and O-3 /O-2 mixtures and the substrate position in the reactor. The structure of the intermediates was estimated from the chemical analysis of nano meter-sized particles generated during the film formation. The flow sh ape, the substrate dependence, and the chemical structure of films dep ended mainly on C-TEOSin and C-O3in; but were independent of C-O3s. Th e parameter t(r) had little effect on the flow shape and substrate dep endence. The intermediates that led to the formation of films with exc ellent flow shape and a small amount of water contained a large amount of carbon.