Pv. Buragohain et al., NOVEL RESIN-BASED ULTRAPURIFICATION SYSTEM FOR REPROCESSING IPA IN THE SEMICONDUCTOR INDUSTRY, Industrial & engineering chemistry research, 35(9), 1996, pp. 3149-3154
There is an urgent need for the development of energy-efficient recycl
ing and ultrapurification processes for 2-propanol solvent wastes gene
rated from the semiconductor industry. In this paper, experimental res
ults are presented that set the stage for the development of efficient
resin-based closed-loop recycling systems for 2-propanol drying appli
cations in the semiconductor industry. The process employs ion exchang
e resins to reduce cations and anions to low and sub-part-per-billion
levels. Batch adsorption experiments were carried out in 2-propanol to
determine the adsorption isotherms of various ions on commercially av
ailable ion exchange resins. The results indicate that ion exchange re
sins indeed have both high affinity and capacity for ions in the relat
ively nonpolar 2-propanol solvent. Under dynamic flow conditions, colu
mns of appropriate column diameter and length packed with the resins w
ere indeed capable of reducing ionic impurities to low parts-per-billi
on levels. In fact, long-term experiments indicate that these systems
can generate ultrapure 2-propanol from relatively large volumes of sol
vent waste. In addition to the ionic impurities, it is necessary to re
move water and organic contaminants from the solvent. Columns packed w
ith activated carbon and molecular sieves were shown to be efficacious
in removing organic and water impurities, respectively, from 2-propan
ol to low levels required for semiconductor applications.