The DC and RF performance of a 0.25 mu m gatelength p-type SiGe modula
tion-doped field-effect transistor (MODFET) is reported, The hole chan
nel consists of compressively strained Si0.3Ge0.7 layer grown on a rel
axed Si0.7Ge0.3 buffer on a Si substrate, The combination of high-hole
mobility, low-gate leakage current, and improved ohmic contact metall
ization results in an enhancement of the DC and RF performance. A maxi
mum extrinsic transconductance (Gm(ext)) of 230 mS/mm was measured, A
unity current gain cut-off frequency (fT) of 24 GHz and a maximum freq
uency of oscillation (f(max)) of 37 GHz were obtained for these device
s.