GOLD NANOCLUSTER FORMATION IN SILICATE-GLASSES BY LOW FLUENCE ION-IMPLANTATION AND ANNEALING

Citation
G. Battaglin et al., GOLD NANOCLUSTER FORMATION IN SILICATE-GLASSES BY LOW FLUENCE ION-IMPLANTATION AND ANNEALING, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 116(1-4), 1996, pp. 527-530
Citations number
17
Categorie Soggetti
Physics, Nuclear","Nuclear Sciences & Tecnology","Instument & Instrumentation
ISSN journal
0168583X
Volume
116
Issue
1-4
Year of publication
1996
Pages
527 - 530
Database
ISI
SICI code
0168-583X(1996)116:1-4<527:GNFISB>2.0.ZU;2-Q
Abstract
Gold ions have been implanted (285 keV, 8 x 10(15) cm(-2)) into fused silica and nine other different silicate glasses (commercially availab le and laboratory prepared glasses). We have studied the influence of annealing processes up to 1080 degrees C for silica and 600 degrees C for the other glasses. Only after the highest annealing temperatures d o the samples display an optical absorption band peaked at a wavelengt h of about 520 nm, characteristic of surface plasmon resonance of gold nanoparticles. Differences in the gold concentration profiles have be en attributed to radiation enhanced diffusion and structural differenc es, Optical absorption spectra reflect structural differences. First t ransmission electron microscopy measurements showed that the gold prec ipitates were nearly spherical with diameters of a few nanometers.