ELECTRICAL-PROPERTIES OF METAL, LANGMUIR-BLODGETT (POLYMERALDINE BASE) LAYER, METAL DEVICES

Citation
Mk. Ram et al., ELECTRICAL-PROPERTIES OF METAL, LANGMUIR-BLODGETT (POLYMERALDINE BASE) LAYER, METAL DEVICES, Journal of applied polymer science, 63(2), 1997, pp. 141-145
Citations number
31
Categorie Soggetti
Polymer Sciences
ISSN journal
00218995
Volume
63
Issue
2
Year of publication
1997
Pages
141 - 145
Database
ISI
SICI code
0021-8995(1997)63:2<141:EOML(B>2.0.ZU;2-U
Abstract
Metal-insulator-metal structures have been fabricated by sandwiching p olyemeraldine base Langmuir-Blodgett (LB) films between metals like si lver and indium vacuum-deposited onto indium-tin-oxide (ITO) glass. Th ese devices have been found to exhibit insulating properties in the ab sence of a metal oxide layer. Current (I)-voltage (V) and capacitance (C)-voltage (V) measurements have been carried out on such devices. It is seen that these devices show rectification behavior at about 3 V f or both forward and reverse bias conditions. However, at low voltages, nonlinear and asymmetric behaviors have been observed, whereas plot o f log 1 versus V-1/4 indicates linear characteristics at high fields. The value of the barrier height has been found to be about 1.2 V in ag reement with literature, implying Schottky behavior. (C) 1997 John Wil ey & Sons, Inc.