A new approach to designing computer-generated multilevel diffractive
elements, in which the phase and the amplitude of the output wavefront
can be controlled independently, is presented. In this approach the d
iffraction efficiency of the elements can be arbitrarily controlled to
reach 100% efficiency over the entire element. The approach is based
on varying the local diffraction efficiency by changing the width and
the number of levels in every period. To reduce complexity, an algorit
hm for designing the element with the least number of levels and masks
is developed. This design algorithm determines the needed mask parame
ters in which compensation for distortions introduced by the lithograp
hic recording of the element are taken into account, Calculated and ex
perimental investigations that confirm the new design approach are pre
sented. (C) 1996 Society of Photo-Optical Instrumentation Engineers.