LOW-TEMPERATURE, AEROSOL-ASSISTED CHEMICAL-VAPOR-DEPOSITION (AACVD) OF CDS, ZNS, AND CD1-XZNXS USING MONOMERIC SINGLE-SOURCE PRECURSORS - M(SOCCH3)(2)TMEDA

Authors
NYMAN M HAMPDENSMITH MJ DUESLER EN
Citation
M. Nyman et al., LOW-TEMPERATURE, AEROSOL-ASSISTED CHEMICAL-VAPOR-DEPOSITION (AACVD) OF CDS, ZNS, AND CD1-XZNXS USING MONOMERIC SINGLE-SOURCE PRECURSORS - M(SOCCH3)(2)TMEDA, CHEMICAL VAPOR DEPOSITION, 2(5), 1996, pp. 171
Citations number
34
Categorie Soggetti
Materials Science, Coatings & Films","Materials Sciences, Composites",Electrochemistry,"Physics, Condensed Matter
Journal title
CHEMICAL VAPOR DEPOSITION → ACNP
ISSN journal
09481907
Volume
2
Issue
5
Year of publication
1996
Database
ISI
SICI code
0948-1907(1996)2:5<171:LAC(O>2.0.ZU;2-C
Abstract
Communication: Novel, monomeric single-source precursors for the CVD o f metal sulfides, which are widely used in solar cell technology, are described. The Figure shows the molecular structure of M(SOCCH3)TMEDA, where TMEDA = N,N,N,N-tetramethylethylenediamine, for the Cd and Zn c omplexes. These compounds allow the lowest deposition temperatures so far reported for highly oriented crystalline, stoichiometric films.