Uses a streamline-diffusion finite element method, specially designed
for semiconductor device models, to simulate silicon MESFET devices in
two space dimensions. Considers the full hydrodynamic model, a simpli
fied hydrodynamic model and drift-diffusion model. The method, which r
educes to the well-known Scharfetter-Gummel discretization for the con
ventional drift-diffusion model in one space dimension, proves to be a
robust numerical tool. It performs well also when the solution has la
yers of rapid variation across junctions which are not aligned with me
sh lines. Makes comparisons for the different models. Finds a qualitat
ive discrepancy between the solutions of the hydrodynamic model and th
e drift diffusion model. Observes a small difference, however, between
the full and simplified hydrodynamic models.