MICROSTRUCTURE AND PREFERRED ORIENTATION IN PURE TITANIUM FILMS DEPOSITED BY 2-FACING-TARGET-TYPE DC SPUTTERING

Pure Ti films were produced by two-facing-target-type DC sputtering un der various preparation conditions such as sputtering gas pressure, su bstrate temperature and film thickness, and their microstructures were investigated by both X-ray diffractometry and scanning electron micro scopy. The microstructures were explained well in terms of structure z one, based on the Thomton's model concerning the morphology in sputter ed films. It is also shown that a one-to-one correspondence does not a lways exist between columnar structure and preferred orientation.