REMOTE DEPOSITION OF SCRATCH RESISTANT FILMS BY USE OF SLOT ANTENNA MICROWAVE PLASMA SOURCE

Authors
KORZEC D TRAUB K WERNER F ENGEMANN J
Citation
D. Korzec et al., REMOTE DEPOSITION OF SCRATCH RESISTANT FILMS BY USE OF SLOT ANTENNA MICROWAVE PLASMA SOURCE, Thin solid films, 282(1-2), 1996, pp. 143-145
Citations number
20
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
Thin solid films → ACNP
ISSN journal
00406090
Volume
282
Issue
1-2
Year of publication
1996
Pages
143 - 145
Database
ISI
SICI code
0040-6090(1996)282:1-2<143:RDOSRF>2.0.ZU;2-1
Abstract
The slot antenna microwave plasma source is used for remote plasma dep osition of scratch resistant films on polycarbonate substrates. A grid separates the primary discharge from the process chamber. The monomer hexamethyldisiloxan is distributed 5-50 mm over the substrate positio ned 5-25 cm from the separation grid. With argon in the primary discha rge a good sticking interface polymer layer grows. An additional amoun t of oxygen leads to a quartzlike layer on top. Deposition rate is typ ically 0.5 mu m/min. Rubber and tumble abrasion tests are used to char acterise the scratch resistance.