E. Kusano et A. Kinbara, INVESTIGATION OF THE EFFECTS OF PUMPING SPEED AND AR O-2 RATIO ON THETRANSIENT TIME AT MODE TRANSITION IN TI-O-2 REACTIVE SPUTTERING/, Thin solid films, 282(1-2), 1996, pp. 423-426
The effects of the pumping speed and the Ar/O-2 flow rate ratio on the
transient time needed to reach a steady-state, after glow discharge i
gnition in Ti-O-2 reactive sputtering, were investigated. It was shown
that the O-2 partial pressure, deposition rate, discharge voltage and
the Ti emission intensity change continuously after glow discharge ig
nition until the process reaches a steady-state. The transient time in
creases as the pumping speed increases or as the Ar/O-2 ratio increase
s. The results suggest that a low pumping speed or a low Ar/O-2 ratio
shortens the transient time for process operation parameter changes su
ch as a reactive gas flow rate change.