INVESTIGATION OF THE EFFECTS OF PUMPING SPEED AND AR O-2 RATIO ON THETRANSIENT TIME AT MODE TRANSITION IN TI-O-2 REACTIVE SPUTTERING/

Citation
E. Kusano et A. Kinbara, INVESTIGATION OF THE EFFECTS OF PUMPING SPEED AND AR O-2 RATIO ON THETRANSIENT TIME AT MODE TRANSITION IN TI-O-2 REACTIVE SPUTTERING/, Thin solid films, 282(1-2), 1996, pp. 423-426
Citations number
9
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
282
Issue
1-2
Year of publication
1996
Pages
423 - 426
Database
ISI
SICI code
0040-6090(1996)282:1-2<423:IOTEOP>2.0.ZU;2-R
Abstract
The effects of the pumping speed and the Ar/O-2 flow rate ratio on the transient time needed to reach a steady-state, after glow discharge i gnition in Ti-O-2 reactive sputtering, were investigated. It was shown that the O-2 partial pressure, deposition rate, discharge voltage and the Ti emission intensity change continuously after glow discharge ig nition until the process reaches a steady-state. The transient time in creases as the pumping speed increases or as the Ar/O-2 ratio increase s. The results suggest that a low pumping speed or a low Ar/O-2 ratio shortens the transient time for process operation parameter changes su ch as a reactive gas flow rate change.