STM MODIFICATION OF MOS2 IN THE NANOMETER-SCALE USING A GAS-SOLID REACTION

Citation
M. Kohno et al., STM MODIFICATION OF MOS2 IN THE NANOMETER-SCALE USING A GAS-SOLID REACTION, Thin solid films, 282(1-2), 1996, pp. 588-590
Citations number
11
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
282
Issue
1-2
Year of publication
1996
Pages
588 - 590
Database
ISI
SICI code
0040-6090(1996)282:1-2<588:SMOMIT>2.0.ZU;2-B
Abstract
We report on the nanometer-scale modification of a MoS2 surface by sca nning tunneling microscopy (STM) with an electric field lower than tha t required for field evaporation by STM. It is known that a Pt-Ir STM tip dissolves H-2 gas into atomic hydrogen which is chemically active. We applied this phenomenon to STM modification to lower the electric field necessary for atom detachment. A Pt-Ir tip was used to dissolve the H-2 gas on the MoS2 surface. The gas-solid reaction enhanced the e vaporation of the top-layer sulfur atoms, which were removed at a low electric field of about 2.4 V nm(-1). The present study shows that we can control STM modification well with the same feedback loop as that used for STM observation.