SILICON MICROTIP FABRICATION TECHNIQUES

In this paper we review the different processes to fabricate silicon m icrotips. We present successively the simple process where silicon is deposited, then the more complex processes on silicon substrates with non aligned extraction gate and finally self-aligned gate. The introdu ction of more recent techniques such as Reactive Ion Etching RIE and C hemical Mecano Polishing CMP open the way to the industrial fabricatio n of reliable microcathodes.