Ns. Mcintyre et al., QUANTITATIVE XPS MEASUREMENTS OF SOME OXIDES, SULFIDES AND COMPLEX MINERALS, Surface and interface analysis, 24(9), 1996, pp. 591-596
A number of binary oxides, sulphide compounds and complex minerals hav
e been analysed by x-ray photoelectron spectroscopy to give the relati
ve intensities of major photoelectron lines, Where possible, compound
surfaces were prepared by fracturing in vacuo or in inert gas to avoid
contamination. Alternatively, some of these compounds have undergone
a mild thermal treatment in vacuo to remove much of the surface contam
ination which normally affects such intensity measurements, The experi
mental line intensity ratios were corrected only by their particular p
hotoelectron cross-section and inelastic mean free paths, For most oxi
des and complex minerals studied, good agreement is obtained with the
expected stoichiometry, particularly when using photoelectron lines of
higher kinetic energy, This tends to support the use of a simple back
ground approximation when measuring specifically with those oxides inv
olving non-transition elements, The sulphides studied mostly involved
transition metals; agreement between calculated and actual stoichiomet
ry was only modest, Some differences in measured surface stoichiometry
occurred as a result of the ambient conditions within which the fract
ure was made; fracture in vacuo produced a different S/M ratio than di
d fracture in an inert pas environment.