OPTICAL AND MECHANICAL-PROPERTIES OF REACTIVELY SPUTTERED SILICON DIOXIDE FILMS

The reactive sputtering method, using an Ar/O-2 mixture, was applied t o deposit silicon dioxide film. Both x-ray photoemission spectroscopy (XPS) and infrared absorption spectroscopy were employed to evaluate t he structure of SiO2 films sputtered at various oxygen percentages. Th e optical and mechanical properties of SiO2 films on glass substrates were investigated. Films prepared at a higher oxygen content have a hi gher density and a higher refractive index.