MAGNETORESISTANCES OF ULTRATHIN FINE CU-PARTICLE AND CUAU-PARTICLE FILMS

Citation
Jj. Lin et S. Kobayashi, MAGNETORESISTANCES OF ULTRATHIN FINE CU-PARTICLE AND CUAU-PARTICLE FILMS, Surface review and letters, 3(1), 1996, pp. 97-102
Citations number
12
Categorie Soggetti
Physics, Condensed Matter","Physics, Atomic, Molecular & Chemical","Material Science
Journal title
ISSN journal
0218625X
Volume
3
Issue
1
Year of publication
1996
Pages
97 - 102
Database
ISI
SICI code
0218-625X(1996)3:1<97:MOUFCA>2.0.ZU;2-K
Abstract
We have measured the magnetoresistances in approximate to 30-Angstrom- thick fine Cu-particle and Au-doped Cu-particle (CuAu-particle) films between 2.1 and 4.2 K and in magnetic fields H up to 6 T, with sheet r esistances R(square)(4.2 K) of the films ranging from approximate to 1 0 k Omega to 2 M Omega. We find that the magnetoresistances are positi ve, exhibiting broad maxima, at low H, while they can change sign and become negative at high H. The magnitudes of the normalized magnetores istances, Delta R(square)(H)/R(square)(0) = [R(square)(H) - R(square)( 0)]/R(square)(0), are of the order of a tenth of a percent, depending on the values of R(square). Particularly, the magnetoresistances in pu re Cu-particle films are essentially isotropic, regardless of the orie ntation of H being applied parallel or perpendicular to the film plane . In CuAu-particle films, however, more negative perpendicular magneto resistances relative to parallel magnetoresistances are observed. Ther e observations are closely connected with the fine-particle structure of our films. Explanation for our experimental results in terms of cur rent theories is presented.