Raman spectra were measured for carbon-doped SiO2 thin films prepared
by an rf cosputtering method. The changes in the spectra were systemat
ically studied as a function of the annealing temperature. From a deta
iled analysis of the spectra, the following conclusions were drawn. In
the as-deposited films, very small carbon clusters are embedded in th
e SiO2 matrices. When the films are annealed at 600 degrees C, graphit
e-like sp(2) bonds begin to develop in the clusters. Upon annealing wi
th higher temperatures, the size of sp(2) bond clusters increases. How
ever, the growth of graphite microcrystals can be ruled out, since hig
h-resolution transmission electron microscopic images of the samples a
nnealed at 1000 degrees C do not show lattice fringes due to graphite
microcrystals. The samples annealed at 1000 degrees C were found to ex
hibit an extinction hump around 220 nm, very similar to that seen in t
he interstellar extinction spectra.