MECHANICAL-PROPERTIES OF AMORPHOUS-CARBON NITRIDE FILMS

Thin carbon nitride (CN) films have been prepared by de sputtering fro m a graphite target in an argon/nitrogen plasma. The film composition and structure were examined by energy dispersive X-ray microanalysis, Rutherford back-scattering and transmission electron microscopy. The m icrohardness of the films was measured with both Vickers micro-indenta tion and a depth-sensing indentation technique. The resistance of the films to small-scale abrasion was evaluated with a novel micro-scale a brasion test. The hardness indentations and wear scars were studied by scanning electron microscopy. The properties of the films were compar ed with those of titanium nitride (TiN) films deposited using the same technique. The CN films showed significantly greater elastic recovery of the hardness indentations than TiN, and were more ductile in their response to indentation. Prime novelty. Increased understanding of th e hardness and abrasion resistance of amorphous carbon nitride films.