FABRICATION OF A SILICON-BASED SUPERFLUID OSCILLATOR

Citation
K. Schwab et al., FABRICATION OF A SILICON-BASED SUPERFLUID OSCILLATOR, Journal of microelectromechanical systems, 5(3), 1996, pp. 180-186
Citations number
16
Categorie Soggetti
Engineering, Eletrical & Electronic
ISSN journal
10577157
Volume
5
Issue
3
Year of publication
1996
Pages
180 - 186
Database
ISI
SICI code
1057-7157(1996)5:3<180:FOASSO>2.0.ZU;2-H
Abstract
We have constructed an integrated superfluid oscillator using various silicon processing techniques, including micromachining and electron b eam lithography. This device has the advantage of a very small interna l volume (0.72 mm(3)). This makes it insensitive to spurious external acoustic noise which has limited the performance of larger experiments . We have tested the performance of this device in two configurations, one with a single micro-aperture and another with an additional fine tube. Both configurations demonstrate macroscopic quantum phenomena in superfluid He-4 at low temperatures (0.25 K < T < 2.2 K) and have bee n used to study these effects in detail.