EFFECTS OF TI DOPING ON THE STRUCTURES AND MAGNETIC-PROPERTIES OF FE16N2 FILMS

(Fe,Ti)-N films with the titanium concentration C-Ti = 0-35 at% were p repared on Si(100) and NaCl substrates held at 150 degrees C by facing -target sputtering. The effects of Ti doping on the structures and mag netic properties of Fe-N films were investigated. The crystal structur es of the (Fe, Ti)-N films were examined with an x-ray diffractometer and a transmission electron microscope. The formation of magnetic iron nitride phases is sensitive to the Ti doping concentration. Films wit h C-Ti = 3-10 at.% contain alpha ''-(Fe, Ti)(16)N-2 and (Fe, Ti)(4)N p hases, and films with C-Ti = 25 at.% contain (Fe, Ti)(4)N and TiN phas es, but there is no magnetic iron nitride phase in the firms with C-Ti = 35 at.%. The saturation magnetization M(s) of(Fe, Ti)-N films with C-Ti = 0-10 at% was larger than that of pure bcc iron. M(s) was 2.6 T for C-Ti = 5 at.% samples, which is higher than the value for pure iro n by 17%.