THE INTERACTION OF THE SUPERSONIC PLASMA-JET WITH THE SUBSTRATE IN THE RF PLASMA-CHEMICAL REACTOR

Authors
SICHA M HUBICKA Z TICHY M NOVAK M SOUKUP L JASTRABIK L BEHNKE JF KAPICKA V KAPOUN K SERY M
Citation
M. Sicha et al., THE INTERACTION OF THE SUPERSONIC PLASMA-JET WITH THE SUBSTRATE IN THE RF PLASMA-CHEMICAL REACTOR, Contributions to Plasma Physics, 36(5), 1996, pp. 605-611
Citations number
13
Categorie Soggetti
Phsycs, Fluid & Plasmas
Journal title
Contributions to Plasma Physics → ACNP
ISSN journal
08631042
Volume
36
Issue
5
Year of publication
1996
Pages
605 - 611
Database
ISI
SICI code
0863-1042(1996)36:5<605:TIOTSP>2.0.ZU;2-X
Abstract
Although the plasma-chemical processes and properties of the deposited thin film can strongly depend on the interaction of the supersonic pl asma jet channel with the substrate, up to now the study of this pheno menon has not yet been done. We decided to study this interaction by m eans of CCD camera. The presented results indicate that the light inte nsity recorded close to the substrate can be used as a measure of the intensity of plasma-chemical deposition processes on the substrate sur face.