IMPROVED WITHIN-WAFER UNIFORMITY MODELING THROUGH THE USE OF MAXIMUM-LIKELIHOOD-ESTIMATION OF THE MEAN AND COVARIANCE SURFACES (VOL 143, PG3404, 1996)

Authors
DAVIS JC HUGHESOLIVER JM LU JC GYURCSIK RS
Citation
Jc. Davis et al., IMPROVED WITHIN-WAFER UNIFORMITY MODELING THROUGH THE USE OF MAXIMUM-LIKELIHOOD-ESTIMATION OF THE MEAN AND COVARIANCE SURFACES (VOL 143, PG3404, 1996), Journal of the Electrochemical Society, 143(12), 1996, pp. 4129-4129
Citations number
1
Categorie Soggetti
Electrochemistry
Journal title
Journal of the Electrochemical Society → ACNP
ISSN journal
00134651
Volume
143
Issue
12
Year of publication
1996
Pages
4129 - 4129
Database
ISI
SICI code
0013-4651(1996)143:12<4129:IWUMTT>2.0.ZU;2-E