Vm. Pinchuk et Tv. Yanchuk, EFFECT OF HYDROGEN ON FRENKEL-PAIR ANNIHILATION IN SILICON - A QUANTUM-CHEMICAL STUDY, Semiconductors, 30(12), 1996, pp. 1111-1115
Energy barriers for Frenkel pair formation and annihilation in a hydro
gen-saturated silicon lattice are calculated using the technique of th
e self-consistent field of molecular orbitals with linear combination
of atomic orbitals (SCF MO LCAO), partially neglecting diatomic differ
ential overlap (NDDO) of the energy barriers, which must be overcome t
o form Frenkel pairs and to annihilate them in a hydrogen-saturated si
licon lattice. The calculations were carried out for the optimized geo
metries of an ideal Si crystal, a cluster with a vacancy, and a cluste
r with a vacancy and different numbers of hydrogen atoms. It is shown
that 1) near a vacancy site, hydrogen is preferentially localized as a
second-nearest neighbor, 2) the availability of hydrogen near a vacan
cy results in a dramatic lowering of the potential barrier for Frenkel
-pair annihilation, and 3) the height of the potential barrier is sign
ificantly affected by the charge state of the hydrogen (H-0, H+, H-).
The degree of lattice relaxation near the vacancy is determined as a f
unction of the presence of hydrogen and as a function of its charge st
ate. The calculations support the proposed model of enhanced annealing
of vacancy defects in silicon with oxygen and agree with the well-kno
wn experimental results. (C) 1996 American Institute of Physics.