We have applied ion-implantation inhibit patterning as a new method of
fabricating low-loss microwave transmission lines in high-temperature
superconductor thin films. To determine the effectiveness of this tec
hnique, we-fabricated coplanar waveguide transmission lines in YBa2Cu3
O7-delta thin films that had been deposited on LaAlO3 substrates using
pulsed laser deposition. Microwave characterizations of these lines a
re compared to a reference line fabricated with conventional ion milli
ng. At 76 K and 12 GHz, the attenuation constants of the ion-implanted
transmission lines are approximated 0.02 dB/mm, and the overall loss
response is indistinguishable from that of the ion-milled device. (C)
1996 American Institute of Physics.