ELECTRODEPOSITION OF CU NI MULTILAYERS WI TH PULSED ELECTRIC REGIMES/

Electrodeposition of Cu/Ni multilayers with pulsed electric regimes. P ulsed potenstiostatic deposition offers a new mean for the elaboration of multilayers to produce magnetic sensors. Alternate layers of Ni of nominal thickness from a few angstroms to a few microns separated by a copper film have been electrodeposited from a single electrolyte hav ing a low copper concentration. The thicknesses and deposition rate ha ve been moreover followed insitu with a quartz microbalance in order t o get more information to explain the physical properties of the mater ials.