TIGHT-BINDING PARAMETERS FOR SILICON BORON INTERACTIONS WITH APPLICATION TO BORON DEFECT PAIRS IN CRYSTALLINE SILICON

Citation
Pb. Rasband et al., TIGHT-BINDING PARAMETERS FOR SILICON BORON INTERACTIONS WITH APPLICATION TO BORON DEFECT PAIRS IN CRYSTALLINE SILICON, Philosophical magazine. B. Physics of condensed matter. Statistical mechanics, electronic, optical and magnetic, 73(1), 1996, pp. 71-84
Citations number
39
Categorie Soggetti
Physics, Applied",Mechanics,"Physics, Condensed Matter","Material Science
ISSN journal
13642812
Volume
73
Issue
1
Year of publication
1996
Pages
71 - 84
Database
ISI
SICI code
1364-2812(1996)73:1<71:TPFSBI>2.0.ZU;2-F
Abstract
set of empirical tight-binding parameters using the well established G oodwin-Skinner-Pettifor functional form has been produced to describe the interactions between Si and B atoms. The Si-B parameters presented here have been chosen to reproduce ground-state band structure and to tal energies obtained from ab initio calculations. In addition to a di scussion regarding the parameter development, this work also presents some examples of the application of the Si-B tight-binding model to th e study of defect-dopant pair formation.