H. Varel et al., LASER-INDUCED DAMAGE IN SIO2 AND CAF2 WITH PICOSECOND AND FEMTOSECONDLASER-PULSES, Applied physics A: Materials science & processing, 62(3), 1996, pp. 293-294
Single- and multiple-shot damage thresholds and plasma-emission thresh
olds for fused silica and CaF2 are reported for 790 nm photons as a fu
nction of laser pulse width (190 fs - 4.5 ps). The results are compare
d with single-shot plasma-emission measurements [1] and with multiple-
shot damage measurements [2]. Both the damage threshold and the plasma
-emission threshold are shown to decrease with decreasing pulse width
over the entire pulse-width range investigated.