LASER-INDUCED DAMAGE IN SIO2 AND CAF2 WITH PICOSECOND AND FEMTOSECONDLASER-PULSES

Citation
H. Varel et al., LASER-INDUCED DAMAGE IN SIO2 AND CAF2 WITH PICOSECOND AND FEMTOSECONDLASER-PULSES, Applied physics A: Materials science & processing, 62(3), 1996, pp. 293-294
Citations number
5
Categorie Soggetti
Physics, Applied
ISSN journal
09478396
Volume
62
Issue
3
Year of publication
1996
Pages
293 - 294
Database
ISI
SICI code
0947-8396(1996)62:3<293:LDISAC>2.0.ZU;2-5
Abstract
Single- and multiple-shot damage thresholds and plasma-emission thresh olds for fused silica and CaF2 are reported for 790 nm photons as a fu nction of laser pulse width (190 fs - 4.5 ps). The results are compare d with single-shot plasma-emission measurements [1] and with multiple- shot damage measurements [2]. Both the damage threshold and the plasma -emission threshold are shown to decrease with decreasing pulse width over the entire pulse-width range investigated.