ESR and gel permeation chromatographic measurements of poly(diethylsil
ane) and poly(cyclohexylmethylsilane) gamma-irradiated at temperatures
between 77 K and 300 K were carried out to elucidate the mechanism of
radiation-induced degradation of polysilanes. Radical species observe
d after the irradiation are not silyl-type radicals generated by the c
leavage of the Si-Si bond but alkyl radicals generated by the scission
of the C-H bond. The G value of the main-chain scission depends stron
gly on the irradiation temperature and dose. It is proposed that sigma
-conjugation along the main chain allows the migration of the radiatio
n energy to the weakest bond in the main chain where the direct scissi
on of the bond is induced.