Thin Film chemical compositional profiling is reviewed with emphasis o
n Auger Electron Spectroscopy (AES) and X-Ray Photoelectron Spectrosco
py (XPS). 4 different zones of a depth profile can be distinguished (1
) initial zone ((2) 6 nm) before reaching steady state conditions, (2)
the steady state within the film, (3) interface between film and subs
trate and (4) the substrate. A practical approach is presented to dete
rmine quantitative information using elemental sensitivity factors and
sputter yields. The limiting parameter is the destructive nature of p
rofiling. Optimization of the experimental parameters such as ion beam
energy, sample roughness, crystalline orientation and geometrical cra
ter edge is necessary for good depth resolution. Ni/Cr multi-layer AES
and XPS profiles are presented with and without Zalar rotation.