A POWER IC TECHNOLOGY WITH EXCELLENT CROSS-TALK ISOLATION

Citation
Wwt. Chan et al., A POWER IC TECHNOLOGY WITH EXCELLENT CROSS-TALK ISOLATION, IEEE electron device letters, 17(10), 1996, pp. 467-469
Citations number
9
Categorie Soggetti
Engineering, Eletrical & Electronic
ISSN journal
07413106
Volume
17
Issue
10
Year of publication
1996
Pages
467 - 469
Database
ISI
SICI code
0741-3106(1996)17:10<467:APITWE>2.0.ZU;2-S
Abstract
This paper reports a low-cost, excellent cross-talk isolation power in tegrated circuit (PIC) technology capable of integrating high-voltage LDR MOS, high-voltage LIGBT, and low-voltage CMOS control circuit. The technology is implemented using a conventional twin-well CMOS process with no compromise on the CMOS devices, and the breakdown voltages of the LDMOS and LIGBT with drift length of 40 mu m are over 400 V. Usin g this technology, operating current of the body diode of the LDMOS ca n be improved by over 16 times and operating current of the LIGBT can be improved by over five times before CMOS Latch-up in the control cir cuit occurs.