INP-BASED SELF-ALIGNED NORMALLY-OFF SUPERLATTICE-INSULATED-GATE FIELD-EFFECT TRANSISTOR

Citation
Cl. Chen et al., INP-BASED SELF-ALIGNED NORMALLY-OFF SUPERLATTICE-INSULATED-GATE FIELD-EFFECT TRANSISTOR, IEEE electron device letters, 17(10), 1996, pp. 476-478
Citations number
13
Categorie Soggetti
Engineering, Eletrical & Electronic
ISSN journal
07413106
Volume
17
Issue
10
Year of publication
1996
Pages
476 - 478
Database
ISI
SICI code
0741-3106(1996)17:10<476:ISNSF>2.0.ZU;2-N
Abstract
An InP-based normally-off superlattice-insulated-gate field-effect tra nsistor (SIGFET) is developed using a self-aligned implant profess. Th e new gate structure reduces the gate current significantly and yields a sharp pinch off. A SIGFET with 0.7 mu m gate length delivers more t han 800 mA/mm of drain current at 2 V of forward gate bias and yields an f(T) as high as 42 GHz. An explanation for a new kink effect is als o proposed.