Yc. Chou et al., OFF-STATE BREAKDOWN EFFECTS ON GATE LEAKAGE CURRENT IN POWER PSEUDOMORPHIC ALGAAS INGAAS HEMTS/, IEEE electron device letters, 17(10), 1996, pp. 479-481
The effects of off-state breakdown on characteristics of power AlGaAs/
InGaAs pseudomorphic HEMT's (PHEMT's) are investigated in detail. Whil
e the gate leakage current is substantially decreased after breakdown
stress, no obvious changes in drain-to-source current and transconduct
ance are observed. Prior to breakdown stress, gate leakage current sho
ws a nearly ideal 1/f noise characteristics with an Ig(2) dependence,
suggesting a surface generation-recombination current from the interfa
ce of passivation layer. After stress, the gate current noise can be d
rastically reduced. The results suggest an alternative for alleviating
the gate leakage current in PHEMT's.