FTIR INVESTIGATION OF RF PLASMA-DEPOSITED INDIUM-TIN OXIDE-FILMS ON GLASSES

Indium-tin oxide (ITO) thin films were coated on soda-lime silicate (S LS) and silica glasses by a newly developed an RF plasma mist depositi on process. Diffuse reflectance infrared Fourier transform. (DRIFT) sp ectroscopy was used to investigate the ITO films and interfaces betwee n the films and the glasses. The infrared results indicated that the n etwork structure near the glass-film interface is significantly modifi ed by the indium and/or tin oxide coatings. During film deposition, de positing materials diffused into the glass substrates and created non- bridging oxygens near the surface of the glasses, which breaks down th e network structure of the glasses. The glass structure was affected m ore significantly with a higher indium concentration. The deposited ma terials had stronger effects on the tin-side of SLS glass than on the air-side, at higher indium concentration.