INFRARED STUDY OF THE REACTIONS OF ATOMIC DEUTERIUM WITH AMORPHOUS-SILICON MONOHYDRIDE

Attenuated total reflection Fourier transform infrared spectroscopy (A TR-FTIR) has been applied to characterize amorphous silicon monohydrid e films before and after reaction with deuterium atoms. The hydride fi lms were grown by chemical vapor deposition on oxide-covered silicon s ubstrates, and the data suggest that the film is terminated by a homog eneous monolayer of primarily dimerized silicon monohydride. Exposure of this film to atomic deuterium causes the replacement of silicon hyd ride with adsorbed deuterium. Only the monodeuteride is formed by reac tion at 200 degrees C. Reaction at -110 degrees C produces mono-, di-, and trideuteride, demonstrating that the isolation of insertion produ cts is temperature-dependent.