A MULTIPLE-NEGATIVE-DIFFERENTIAL-RESISTANCE SWITCH WITH DOUBLE INGAP BARRIERS

Citation
Df. Guo et al., A MULTIPLE-NEGATIVE-DIFFERENTIAL-RESISTANCE SWITCH WITH DOUBLE INGAP BARRIERS, Applied physics letters, 69(27), 1996, pp. 4185-4187
Citations number
9
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
69
Issue
27
Year of publication
1996
Pages
4185 - 4187
Database
ISI
SICI code
0003-6951(1996)69:27<4185:AMSWDI>2.0.ZU;2-4
Abstract
A GaAs-InGaP switch has been fabricated and demonstrated. In this devi ce, double i-InGaP layers are employed to provide the potential barrie rs for carrier tunneling and hole confinement. As sufficient external voltage is applied to this device, a double S-shaped negative-differen tial resistance (NDR) characteristics is obtained resulting from the s equential avalanche multiplications in the high electric held regions. However, because of the poor confinement effect to holes, only a sing le S-shaped NDR phenomenon is observed at higher temperature, With dev ice parameters appropriately adjusted, this device may show prominent potential for multiple-valued logic applications. (C) 1996 American In stitute of Physics.