By using an STM operated in ultrahigh vacuum, we can extract single Si
atoms from any predetermined positions of the Si(111)-(7 x 7) surface
through field evaporation. This technique enables us to create novel
atomic-scale structures, and even to fabricate a single atom groove an
d chain on the surface. The extracted Si atoms can be redeposited onto
the surface, although the crystallographic position of these deposite
d Si atoms changes as their density increases. We have demonstrated th
at natural Si vacancy defects existing on the surface can be repaired
by this technique. The deposited Si atoms can be reremoved by picking
them up again with the tip, the substrate atomic arrangement remaining
unperturbed. We can also remove individual hydrogen atoms from hydrog
en-passivated Si(100)-(2 x 1) surfaces. A chain with equal separation
of Si dimers produced by hydrogen desorption has been created. These r
esults demonstrate the potential of STM for the construction of electr
onic devices with atomic dimensions.