ROOM-TEMPERATURE DEPOSITION OF TITANIUM CARBIDE BY ION-BEAM-ENHANCED REACTION OF TITANIUM FILMS WITH HYDROCARBONS

Citation
A. Schroer et W. Ensinger, ROOM-TEMPERATURE DEPOSITION OF TITANIUM CARBIDE BY ION-BEAM-ENHANCED REACTION OF TITANIUM FILMS WITH HYDROCARBONS, Surface & coatings technology, 84(1-3), 1996, pp. 448-452
Citations number
13
Categorie Soggetti
Materials Science, Coatings & Films
ISSN journal
02578972
Volume
84
Issue
1-3
Year of publication
1996
Pages
448 - 452
Database
ISI
SICI code
0257-8972(1996)84:1-3<448:RDOTCB>2.0.ZU;2-H
Abstract
In this study, titanium was deposited in an atmosphere of ethane and e thene by electron-beam evaporation onto various substrates at ambient temperature. During condensation, titanium was irradiated with argon i ons of medium energy (12 keV) from an ion source. The composition of t he resulting titanium carbide films was studied using Auger electron s pectroscopy. The phase composition and crystal orientation were determ ined using X-ray diffraction. The results show that, by varying the io n current density, partial pressure and gaseous species, the compositi on of the titanium carbide films can be varied widely.