H. Kawarada et al., ELECTRICALLY ISOLATED METAL-SEMICONDUCTOR FIELD-EFFECT TRANSISTORS AND LOGIC-CIRCUITS ON HOMOEPITAXIAL DIAMONDS, JPN J A P 2, 35(9B), 1996, pp. 1165-1168
Isolated metal-semiconductor field effect transistors (MESFETs) have b
een fabricated on homoepitaxial diamonds grown by microwave plasma che
mical vapor deposition. Source, drain and channel regions are fabricat
ed using the surface p-type semiconductive layer unique to hydrogen-te
rminated diamond surfaces. Other areas are irradiated by an argon beam
to obtain highly resistive regions. The maximum transconductance of t
he isolated MESFETs with 7 mu m gate length is 4.5 mS/mm, which is com
parable to that of silicon MOSFET with the same gate length. NOT, NAND
, NOR, and R-S flip-flop circuits have been fabricated for the first t
ime on diamond using enhancement-mode active loads.