ADHESION IMPROVEMENT OF PHOTORESIST ON TIN AL MULTILAYER BY OZONE TREATMENT/

Authors
WAKAMIYA W HIRAYAMA M YASUOKA A KAWAI A
Citation
W. Wakamiya et al., ADHESION IMPROVEMENT OF PHOTORESIST ON TIN AL MULTILAYER BY OZONE TREATMENT/, JPN J A P 2, 35(9B), 1996, pp. 1227-1229
Citations number
9
Categorie Soggetti
Physics, Applied
Journal title
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS → ACNP
Volume
35
Issue
9B
Year of publication
1996
Pages
1227 - 1229
Database
ISI
SICI code
Abstract
The effect of ozone treatment on photoresist adhesion is studied in te rms of thermodynamics. The peeling strength of a photoresist-substrate joint is increased by a factor of about two by ozone treatment. An in crease in the surface free energy of the substrate is responsible for this adhesion improvement.