RAMAN-SCATTERING STUDY OF MICROSTRUCTURE OF N-TYPE POROUS SILICON

Citation
Sk. Deb et al., RAMAN-SCATTERING STUDY OF MICROSTRUCTURE OF N-TYPE POROUS SILICON, Solid state communications, 101(4), 1997, pp. 283-287
Citations number
26
Categorie Soggetti
Physics, Condensed Matter
Journal title
ISSN journal
00381098
Volume
101
Issue
4
Year of publication
1997
Pages
283 - 287
Database
ISI
SICI code
0038-1098(1997)101:4<283:RSOMON>2.0.ZU;2-B
Abstract
We report a detailed Raman scattering study of porous silicon film pre pared on n-type silicon substrate. We observe large enhancement of Ram an scattered signal and also that with increase in laser power the Ram an line shape shows low frequency asymmetry, decrease in frequency of the peak position and reduction in signal enhancement. Our results cou ld be explained consistently only by considering a two layered model o f the microstructure of these films. We argue that this is a simple an d non-destructive technique to look at the layered nature of the micro structure of these materials - so far seen only by high resolution ele ctron microscopy. Copyright (C) Elsevier Science Ltd