A NEW APPROACH TO CONVEX CORNER COMPENSATION FOR ANISOTROPIC ETCHING OF (100)SI IN KOH

Authors
ZHANG QX LIU LT LI ZJ
Citation
Qx. Zhang et al., A NEW APPROACH TO CONVEX CORNER COMPENSATION FOR ANISOTROPIC ETCHING OF (100)SI IN KOH, Sensors and actuators. A, Physical, 56(3), 1996, pp. 251-254
Citations number
4
Categorie Soggetti
Engineering, Eletrical & Electronic","Instument & Instrumentation
Journal title
Sensors and actuators. A, Physical → ACNP
ISSN journal
09244247
Volume
56
Issue
3
Year of publication
1996
Pages
251 - 254
Database
ISI
SICI code
0924-4247(1996)56:3<251:ANATCC>2.0.ZU;2-3
Abstract
The method of convex corner compensation with a [100] bar for [100] si licon rectangular etching proposed by Mayer et al. (J. Electrochem. Se c., 137 (1990) 3947-3951) has been investigated. Limitations of the me thod are discussed, and a modified method is put forward. Both the the oretical analysis and the experimental result are given in this paper.