CRYSTALLIZATION CHARACTERISTICS OF LANIO3 LAYERS AND THEIR EFFECT ON PULSED-LASER DEPOSITED (PB1-XLAX)(ZRYTI1-Y)O-3 THIN-FILMS

Citation
Tf. Tseng et al., CRYSTALLIZATION CHARACTERISTICS OF LANIO3 LAYERS AND THEIR EFFECT ON PULSED-LASER DEPOSITED (PB1-XLAX)(ZRYTI1-Y)O-3 THIN-FILMS, JPN J A P 1, 35(9A), 1996, pp. 4743-4749
Citations number
23
Categorie Soggetti
Physics, Applied
Volume
35
Issue
9A
Year of publication
1996
Pages
4743 - 4749
Database
ISI
SICI code
Abstract
Crystalization characteristics of LaNiO3 (LNO) thin films prepared by either rf magnetron sputtering or pulsed laser deposition (PLD), and t heir effect on the ferroelectric properties of subsequently pulsed-las er-deposited (Pb1-xLax)(ZryTi1-y)O-3 (PLZT) films were examined. Post- annealing of the amorphous LNO layers, which were prepared by room-tem perature sputtering, revealed that the LNO crystallized at temperature s higher than 450 degrees C, and the annealed LNO layers were randomly oriented. However, a substrate temperature of only 250 degrees C was required to form crystalline LNO films in a high-temperature sputterin g process and the resultant films were preferentially (100) oriented w ith low electrical resistivity (rho(s) = 0.55 m Omega . cm). On the ot her hand, a substrate temperature of 400 degrees C was required in sit u. do grow crystalline LNO phase by the PLD process and the obtained f ilms were predominantly (110) oriented with a high resistivity (rho(s) = 6.38 m Omega . cm). The Pt used as an underlay markedly reduced the resistivity (rho(s) = 0.05 m Omega . cm) without changing the texture characteristics of LNO layers. It was also found that a reduction of gas pressure in the deposition chamber could enhance the (100)-oriente d crystallization of LNO in both sputtering or PLD process. PLZT films subsequently deposited by PLD on the LNO layers required a substrate temperature greater than or equal to 500 degrees C to completely elimi nate the pyrochlore phase. The structural characteristics of the PLZT films inherit that of the underlying LNO layer. Ferroelectric and diel ectric properties of PLZT films were optimized when using the (100) LN O-Pt double-layers were used as bottom electrodes. The remanent polari zation and coercive field obtained were P-r = 14.9 mu C/cm(2) and E(c) = 3.5 kV/cm, respectively, and the dielectric constant was 950 with a loss of tan delta < 0.05 at 1 kHz.