THE MECHANICAL AND STRUCTURAL-PROPERTIES OF TI FILMS PREPARED BY FILTERED ARC DEPOSITION

In this study the development of residual stress of are deposited Ti f ilms as a function of the; energy of deposited atoms was investigated. A comparison with the momentum transfer model for Ti films deposited under substrate bias indicate that the films are in a region character ised by momentum values of 50-150 amu(1/2) eV(1/2). The compressive st ress was found to vary from 1.1 GPa to 0.1 GPa and the range of Ti mic rohardness was measured to be 6.7-8.7 GPa. The microchardness varied w ith grain size according the Hall-Fetch relationship. The substrate bi as was varied and the influence on residual stress, microhardness, pre ferred orientation, density surface roughness and topography of the de posited films was investigated. Copyright (C) 1996 Elsevier Science Lt d