FORMATION OF ANODIC OXIDE-FILMS AT THE VANADIUM METALS - A PHOTOELECTRIC POLARIZATION AND IMPEDANCE STUDY

Authors
LILIN SA GRIGOREV VP OSHE EK NECHAEVA ON POPOVA AA
Citation
Sa. Lilin et al., FORMATION OF ANODIC OXIDE-FILMS AT THE VANADIUM METALS - A PHOTOELECTRIC POLARIZATION AND IMPEDANCE STUDY, Russian journal of electrochemistry, 32(12), 1996, pp. 1349-1353
Citations number
18
Categorie Soggetti
Electrochemistry
Journal title
Russian journal of electrochemistry → ACNP
ISSN journal
10231935
Volume
32
Issue
12
Year of publication
1996
Pages
1349 - 1353
Database
ISI
SICI code
1023-1935(1996)32:12<1349:FOAOAT>2.0.ZU;2-T
Abstract
The initial stages of growth of thin oxide films on vanadium, niobium, and tantalum are studied in the course of polarization. The kinetics of anodic behavior of the metals in alcohol solutions of lithium perch lorate is shown to depend on both intrinsic and impurity changes in th e defect structure of oxides caused by the polarization. A pronounced role played in the process rate control by charge-carrier transport th rough the passivating film is confirmed.